The use of nanoparticles to augment the dielectric properties of materials has been an exciting new area of research. We at the Plasma Processing Technology Lab anticipate that by using nanoparticles in the design of nanoengineered dielectric composites, will be able to mitigate a myriad of problems for the fabrication of such dielectrics-charging and radiation damage. Without a design process for emerging nanoengineered dielectric materials that optimizes both the dielectric and damage-resistance properties of these materials, there will be substantial difficulties in meeting the time-line requirements for the next generation materials as specified in the International Technology Roadmap for Semiconductors.
In addition, we are engaged in the ongoing research of stem cell mediation by plasma-processed surfaces. Stem cells are unique cells that possess the ability to become any adult cell type in the body, through a process called differentiation. One factor, which can affect the differentiation of stem cells, is the material on which they grow.